探究吸附装置安装位置对多晶硅除硼磷的影响

doi:10.11962/1006-4990.2019-0249

Abstract

Abstract:

B and P impurtities are the most difficult to remove in polycrystalline silicon production.In order to improve the adsorption effect of the adsorption device for B and P impurities,reduce the impurity content in chlorosilane of polycrystalline silicon raw material and improve the quality of polycrystalline silicon,the rationality of the installation position of the adsorption device in the purification system was analyzed and studied.Through the modification of part of the material pipeline in the purification system,the materials of different components can be absorbed into the same structure of the adsorption device.The adsorption device is in the best working state through debugging.After that,the total impurity content of B and P,adsorption rate and device backwashing frequency after adsorption were compared and analyzed.The results showed that when the adsorption device was installed between the recovery tower and the distillation tower,the adsorption effect was the best,and the adsorption device ran steadily.The determination of the best fit position of the adsorption device in the system improved the adsorption efficiency and stability of the adsorption device,and laid a foundation for the improvement of the quality of polycrystalline silicon.

Key words: polycrystalline silicon, chlorosilane, B and P impurities, adsorption, stability

CLC Number:

TQ127.2

He Yugang,Wang Fang,Sun Qiang,Zhang Xiaowei,Shi Qinghe,Fu Qiang. Effect of adsorption device position on boron and phosphorus removal in polycrystalline silicon[J]. Inorganic Chemicals Industry, 2020, 52(3): 72-74.

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References 20

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Effect of adsorption device position on boron and phosphorus removal in polycrystalline silicon

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