表面活性剂对光卤石中氯化钾结晶介稳区和诱导期的影响

doi:10.11962/1006-4990.2019-0473

摘要/Abstract

摘要：

利用在线监测系统测定了光卤石中氯化钾的溶解度,并采用Van′t Hoff方程对其溶解度数据进行拟合。探讨了不同类型的表面活性剂及其含量对光卤石中氯化钾结晶介稳区宽度的影响以及在不同过饱和度下表面活性剂对诱导期的影响,并结合诱导期数据计算了固-液界面张力γ值。结果表明：Van′t Hoff方程能够对氯化钾溶解度很好地拟合;3种不同类型的表面活性剂都使介稳区宽度变宽;加入阴、阳离子表面活性剂,随着其含量的增大介稳区变宽,而加入非离子表面活性剂,其含量对介稳区宽度的影响不大。在恒定温度下,随着过饱和度增大,结晶诱导期时间变短,而加入表面活性剂使诱导期时间变长。

关键词: 光卤石, 氯化钾, 表面活性剂, 溶解度, 介稳区宽度, 诱导期

Abstract:

The solubility of potassium chloride in carnallite was measured by on-line monitoring system,and the solubility data was fitted by Van′t Hoff equation.The effects of different surfactants and contents on the metastable zone width of potassium chloride in carnallite,and the effects of surfactants on the induction period under different supersaturation were investigated respectively.The solid-liquid interfacial tension γ value was calculated by combining the induction period data.The results showed that the Van′t Hoff equation can fit well to the solubility of potassium chloride.Three surfactants broadened the width of the metastable zone.When the content of anionic and cationic surfactants was increased,the metastable zone width was also broadened.However,the content of non-ionic surfactant had little effect on the metastable zone width.At constant tempera-ture,with the increase of supersaturation,the induction period of crystallization became shorter.However,the addition of sur-factant made the induction period longer.

Key words: carnallite, potassium chloride, surfactant, solubility, metastable zone width, induction period

中图分类号:

TQ131.13

张莉媛,王刚,齐美玲,解玉龙. 表面活性剂对光卤石中氯化钾结晶介稳区和诱导期的影响[J]. 无机盐工业, 2020, 52(6): 46-49.

Zhang Liyuan,Wang Gang,Qi Meiling,Xie Yulong. Effect of surfactants on metastable zone and induction period of KCl crystals in carnallite[J]. Inorganic Chemicals Industry, 2020, 52(6): 46-49.

图/表 6

表1

图1

图2

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图4

表2

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T/℃	物质的量分数x
T/℃	x₁	x₂	x₃	x
10	0.032 7	0.032 2	0.032 8	0.032 6
20	0.035 2	0.034 8	0.034 5	0.034 8
30	0.038 7	0.038 0	0.038 3	0.038 3
40	0.041 8	0.041 6	0.041 8	0.041 7

表面活性剂	T/ ℃	低过饱和度			高过饱和度
表面活性剂	T/ ℃	α	R²	γ/ （mJ·m^-2）	α	R²	γ/ （mJ·m^-2）
空白	20	0.018 49	0.892	9.011	0.829 28	0.904	32.04
阴离子	20	0.026 34	0.979	3.016	0.470 99	0.979	7.887
阳离子	20	0.026 70	0.945	3.030	0.556 83	0.974	8.340
非离子	20	0.026 88	0.939	3.037	0.216 49	0.969	6.080

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