稀土掺杂CeO2的合成及其CMP性能研究

doi:10.19964/j.issn.1006-4990.2024-0164

Abstract

Abstract:

CeO₂ is a commonly used rare earth polishing powder with excellent polishing performance.However，in its polishing research，balancing material removal rate（MRR） and surface roughness（Ra） has always been a key and difficult point.To explore this issue，the solvothermal synthesis method was used to synthesize spherical CeO₂ with regular morphology，uniform particle size，and good dispersibility，which was doped with rare earth elements such as Pr and Y to study the changes in oxygen vacancy formation caused by rare earth doping and the impact of the resulting changes in Ce³⁺ ratio on polishing performance.According to the Ce³⁺ content on the material surface，combined with CMP polishing experiments，the results showed that polishing abrasives with high Ce³⁺ content had better polishing effects on silicon wafers.Among them，Pr-doped CeO₂ abrasives had a MRR of up to 445.71 nm/min，and the average roughness Ra of the silicon wafer surface after polishing was 1.23 nm，respectively.Pr doping could change the chemical state of the Ce-based polishing powder surface，thereby affecting the polishing process.By regulating the morphology，particle size，and chemical state of Ce on the surface of cerium oxide，it was possible to achieve a high material removal rate and ensure good surface roughness for silicon wafers in rare earth-doped CeO₂ polishing powder.This study could provide theoretical and technical guidance for the development of high-performance cerium oxide-based polishing powder.

Key words: CeO₂, solvothermal method, CMP, rare earth element doping, Ce surface chemical state

CLC Number:

TQ133.2

YUAN Shuai, FANG Yangfei, YANG Xiangguang, ZHANG Yibo. Study on synthesis of rare earth-doped CeO₂ and its CMP properties[J]. Inorganic Chemicals Industry, 2024, 56(12): 35-41.

Figures/Tables 12

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离子种类	离子半径/Å	电负性
Ce⁴⁺	0.97
Pr³⁺	1.13	1.32
Y³⁺	1.02	1.29
Sm³⁺	1.08	1.36
Nd³⁺	1.11	1.33
La³⁺	1.16	1.28
Ce³⁺	1.14	1.30

样品	x（Ce³⁺）/%	样品	x（Ce³⁺）/%
CeO_2-_δ	18.47	Sm_0.06Ce_0.94O_2-_δ	28.95
Pr_0.06Ce_0.94O_2-_δ	30.14	Nd_0.06Ce_0.94O_2-_δ	23.41
Y_0.06Ce_0.94O_2-_δ	30.96	La_0.06Ce_0.94O_2-_δ	25.72

样品	MRR/（nm·min^-1）	平均粗糙度Ra/nm
CeO_2-_δ	501.26	1.42
Pr_0.06Ce_0.94O_2-_δ	445.71	1.23
Y_0.06Ce_0.94O_2-_δ	364.90	1.03
Sm_0.06Ce_0.94O_2-_δ	330.81	1.20
Nd_0.06Ce_0.94O_2-_δ	373.74	1.82
La_0.06Ce_0.94O_2-_δ	395.20	1.50

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Inorganic Acid-Base-Salt Committee of CIESC

Study on synthesis of rare earth-doped CeO₂ and its CMP properties

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Study on synthesis of rare earth-doped CeO2 and its CMP properties