探究吸附装置安装位置对多晶硅除硼磷的影响
收稿日期: 2019-09-12
网络出版日期: 2020-03-31
Effect of adsorption device position on boron and phosphorus removal in polycrystalline silicon
Received date: 2019-09-12
Online published: 2020-03-31
多晶硅生产中最难去除的杂质是硼、磷。为提高吸附装置对硼、磷杂质的吸附效果,降低多晶硅原料氯硅烷中的杂质含量,提升多晶硅的品质,对吸附装置在提纯系统中安装位置的合理性进行了分析研究。对提纯系统中部分物料输送管道进行改造,使不同组分的物料进入相同结构的吸附装置进行吸附。调试吸附装置处于最佳工作状态后,对吸附后物料中硼、磷杂质含量的总和、吸附率以及吸附装置反冲洗频率进行对比分析。实验结果表明,当吸附装置安装在回收塔产品进入精馏塔的中间管道处时,吸附装置对硼、磷杂质的吸附效果最佳,且系统运行稳定。吸附装置在提纯系统中最佳安装位置的确定,提高了吸附装置对硼、磷杂质的吸附效果以及系统运行的稳定性,为多晶硅品质的提升奠定了基础。
贺玉刚 , 王芳 , 孙强 , 张晓伟 , 时庆合 , 付强 . 探究吸附装置安装位置对多晶硅除硼磷的影响[J]. 无机盐工业, 2020 , 52(3) : 72 -74 . DOI: 10.11962/1006-4990.2019-0249
B and P impurtities are the most difficult to remove in polycrystalline silicon production.In order to improve the adsorption effect of the adsorption device for B and P impurities,reduce the impurity content in chlorosilane of polycrystalline silicon raw material and improve the quality of polycrystalline silicon,the rationality of the installation position of the adsorption device in the purification system was analyzed and studied.Through the modification of part of the material pipeline in the purification system,the materials of different components can be absorbed into the same structure of the adsorption device.The adsorption device is in the best working state through debugging.After that,the total impurity content of B and P,adsorption rate and device backwashing frequency after adsorption were compared and analyzed.The results showed that when the adsorption device was installed between the recovery tower and the distillation tower,the adsorption effect was the best,and the adsorption device ran steadily.The determination of the best fit position of the adsorption device in the system improved the adsorption efficiency and stability of the adsorption device,and laid a foundation for the improvement of the quality of polycrystalline silicon.
Key words： polycrystalline silicon; chlorosilane; B and P impurities; adsorption; stability
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