6063铝合金CMP中络合剂构效关系研究

doi:10.19964/j.issn.1006-4990.2023-0566

Abstract

Abstract:

6063 aluminum alloy has a wide range of applications in many industries because of its unique properties.Chemical mechanical polishing（CMP） is an ultra⁃precision machining technology that can achieve the global flattening of the plane and obtain an ultra⁃smooth mirror effect.In order to improve the polishing efficiency of 6063 aluminum alloy，the effects of different group（amino and carboxyl） complexing agents on the polishing rate and surface roughness of aluminum alloy and their mechanism were studied，and the influence mechanism of different group complexing agents on CMP processing of 6063 aluminum alloy was analyzed by electrochemical workstation and X-ray photoelectron spectroscopy（XPS）.It was found that the improvement of the polishing performance of 6063 aluminum alloy by carboxylic acid complexing agent was greater than that of amines and amino acids in the polishing slurry system containing hydrogen peroxide，and the removal rate and surface quality were improved with the longer carbon chain of carboxylic acid and amine complexing agent.Amino acid complexing agents exhibited different rules from carboxylic acid and amine complexing agents，and the material removal rate was decreased with the growth of carbon chains.XPS and electrochemical analysis showed that the addition of two different group complexants would form an adsorption layer on the surface of the aluminum alloy and protect the surface of the aluminum alloy.Carboxylic acids and amine complexants with long carbon chains contributed to the corrosion dissolution of aluminum alloy surfaces，thereby increasing the polishing rate.

Key words: chemical mechanical polishing, 6063 aluminum alloy, polishing rate, complexing agent, structure?performance relationship

CLC Number:

TU512.4

JIANG Bowen, LI Yanpei, RUI Yichuan, ZHANG Zefang. Study on structure⁃performance relationship of complex agent in CMP of 6063 aluminum alloy[J]. Inorganic Chemicals Industry, 2024, 56(8): 47-53.

Figures/Tables 16

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References 20

1	OLIVIER S S， SEPPALA L， GILMORE K.Optical design of the LSST camera［C］//Advanced Optical and Mechanical Technologies in Telescopes and Instrumentation.Washington，D.C.：SPIE，2008，7018：892-900.
2	SUN Wenwen， ZHU Yuman， MARCEAU R，et al.Precipitation strengthening of aluminum alloys by room⁃temperature cyclic plasticity［J］.Science，2019，363（6430）：972-975.
3	MAYÉN J， GALLEGOS-MELGAR A， MERCADO-LEMUS V H，et al.Control parameters correlation by multiple linear robust regression for the design of heat treatments for Al-6063 alloy［J］.Experimental Techniques，2019，43（1）：91-103.
4	宋晓明，张振宇，刘杰，等.5083铝合金绿色化学机械抛光液对表面粗糙度的影响及机理分析［J］.表面技术，2022，51（5）：345-353.
	SONG Xiaoming， ZHANG Zhenyu， LIU Jie，et al.Effect and mechanism analysis of green chemical mechanical slurry on surface roughness of 5083 aluminum alloy［J］.Surface Technology，2022，51（5）：345-353.
5	雷红，雒建斌，张朝辉.化学机械抛光技术的研究进展［J］.上海大学学报（自然科学版），2003，9（6）：494-502.
	LEI Hong， LUO Jianbin， ZHANG Chaohui.Advances in chemical mechanical polishing［J］.Journal of Shanghai University（Natural Science Edition），2003，9（6）：494-502.
6	LIU Ping， WANG Yongguang， ZHAO Yongwu，et al. In situ electrochemical behavior of aluminum chemical mechanical polishing at low down pressure in environmentally friendly and weakly alkaline slurry［J］.ECS Journal of Solid State Science and Technology，2018，7（11）：P698-P705.
7	KUO Hongshi， TSAI W T.Effects of alumina and hydrogen peroxide on the chemical⁃mechanical polishing of aluminum in phosphoric acid base slurry［J］.Materials Chemistry and Physics，2001，69：53-61.
8	LIU Shijie.A review on protein oligomerization process［J］.International Journal of Precision Engineering and Manufacturing，2015，16（13）：2731-2760.
9	WANG Zhi， SUN Ming， NIU Xinhuan，et al.Effect of pH value and glycine in alkaline CMP slurry on the corrosion of aluminum by electrochemical analysis［J］.ECS Journal of Solid State Science and Technology，2019，8（6）：P332-P340.
10	SUN Ping， WANG Yongguang， LIU Ping，et al.Synergetic effect of 1，2，4-triazole and glycine on chemical mechanical planarization of aluminum at low polishing pressure in an eco⁃friendly slurry［J］.ECS Journal of Solid State Science and Technology，2020，9（3）：034003.
11	朱玉广，王永光，钮市伟，等.低压力下环保型络合剂和氧化剂对铝合金化学机械抛光的影响［J］.金刚石与磨料磨具工程，2020，40（1）：74-78.
	ZHU Yuguang， WANG Yongguang， NIU Shiwei，et al.Effect of environmental friendly complexing agent and oxidant on CMP of aluminium alloy under low pressure［J］.Diamond & Abrasives Engineering，2020，40（1）：74-78.
12	LI Mengqi， SUN Ming， MA Zhongchen.Study on removal rate and mechanism of copper CMP by complexing agent［J］.Applied Che⁃ mical Industry，2023，52（01）：34-38.
13	杨云点，王胜利，王辰伟，等.不同络合剂与pH对钴CMP去除速率的影响［J］.半导体技术，2020，45（7）：543-549.
	YANG Yundian， WANG Shengli， WANG Chenwei，et al.Effects of different complexing agents and pH values on cobalt removal rate in CMP［J］.Semiconductor Technology，2020，45（7）：543- 549.
14	CHEN Guomei， DU Chunkuan， NI Zifeng，et al.Effect of complexing agent on chemical⁃mechanical polishing of 316L stainless steel［J］.Diamond and Abrasives Engineering，2022，42（6）：753-759.
15	熊伟，白林山，储向峰，等.络合剂对蓝宝石晶片化学机械抛光的影响［J］.机械科学与技术，2014，33（7）：1027-1030.
	XIONG Wei， BAI Linshan， CHU Xiangfeng，et al.Effect of chelating agent on chemical mechanical polishing quality of sapphi⁃re［J］.Mechanical Science and Technology for Aerospace Engineering，2014，33（7）：1027-1030.
16	LIU Jinwei， JIANG Liang， WU Hanqiang，et al.Performance of carboxyl groups in chemical mechanical polishing of GCr15 bearing steel：Effects of carbon chain length and pH［J］.Tribology Letters，2021，69（4）：161.
17	ZHOU Jiakai， NIU Xinhuan， YANG Chenghui，et al.Surface action mechanism and planarization effect of sarcosine as an auxiliary complexing agent in copper film chemical mechanical polishing［J］.Applied Surface Science，2020，529：147109.
18	ZHANG Lifei， LU Xinchun， BUSNAINA A A.The role of carboxylic acids on nanoparticle removal in post CMP cleaning process for cobalt interconnects［J］.Materials Chemistry and Physics，2022，275：125199.
19	LI Tao， SUN Haoyang， WANG Daiqi，et al.High⁃performance chemical mechanical polishing slurry for aluminum alloy using hybrid abrasives of zirconium phosphate and alumina［J］.Applied Surface Science，2021，537：147859.
20	HELAL N H， BADAWY W A.Environmentally safe corrosion inhibition of Mg-Al-Zn alloy in chloride free neutral solutions by amino acids［J］.Electrochimica Acta，2011，56（19）：6581- 6587.

羧酸类络合剂	腐蚀电位/ V	腐蚀电流密度/ （A·cm^-2）
OA	-0.199	-6.549
SucA	-0.211	-6.508
AA	-0.215	-6.148
SubA	-0.237	-5.752

胺类络合剂	腐蚀电位/ V	腐蚀电流密度/ （A·cm^-2）
无络合剂	-0.199	-7.053
EDA	-1.046	-5.608
BDA	-0.722	-5.458
HDA	-0.514	-5.356

氨基酸类络合剂	腐蚀电位/ V	腐蚀电流密度/ （A·cm^-2）
无络合剂	-0.199	-7.053
Gly	-0.627	-5.332
GABA	-0.554	-5.695
ACA	-0.443	-5.969

络合剂	材料去除速率 MRR/（nm·min^-1）	粗糙度 Sa/nm	腐蚀电位/ V	腐蚀电流密度/（A·cm^-2）
无络合剂	266	0.613	-0.199	-7.053
AA	350	0.150	-0.215	-6.148
HDA	344	0.351	-0.514	-5.356
ACA	314	0.269	-0.443	-5.969

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[6]	Li Hao;Zhang Xibin. Effect of complexing agents/surfactants on flowery Co microcrystals prepared by solvothermal method [J]. INORGANICCHEMICALSINDUSTRY, 2010, 0(6): 0-0.

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Study on structure⁃performance relationship of complex agent in CMP of 6063 aluminum alloy

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